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목록Halo implant (1)
날아라팡's 반도체 아카이브

Treshold voltage에 영향을 끼치는 요소들은 분류하면 다음과 같습니다. - Substrate Doping effect : Vertical non-Uniform doping effects / Lateral non-Uniform doping effects - Channel length effect : Normal short channel effects / Reverse short channel effects - Channel width effect : Normal Narrow width effects / Reverse narrow width effects - body & bulk charge effect : Body bias effect and bulk charge effect 이번 포스팅은 Th..
DEVICE PHYSICS
2021. 6. 17. 23:44